Browse by author
Lookup NU author(s): Dr Enrique Escobedo-Cousin, Dr Sarah Olsen, Professor Steve BullORCiD, Professor Anthony O'Neill
Full text for this publication is not currently held within this repository. Alternative links are provided below where available.
In this work, the impact of high temperature annealing typical of CMOS processing on the surface morphology of thin SiGe SRBs is investigated for strained silicon layers above and below the critical thickness.
Author(s): Escobedo-Cousin E, Olsen SH, Bull SJ, O'Neill AG, Coulson H, Claeys C, Loo R, Delhougne R, Caymax M
Publication type: Conference Proceedings (inc. Abstract)
Publication status: Published
Conference Name: Third International SiGe Technology and Device Meeting, ISTDM 2006 - Conference Digest
Year of Conference: 2006
Pages: 1-2
Publisher: IEEE Press
URL: http://dx.doi.org/10.1109/ISTDM.2006.246495
DOI: 10.1109/ISTDM.2006.246495
Library holdings: Search Newcastle University Library for this item
ISBN: 9781424404612