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Carbon-tin defects in silicon

Lookup NU author(s): Richard Jones, Suzanne Johnson

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Abstract

Infrared absorption experiments and ab initio computer simulations are used to study tin-carbon centers in silicon. Electron irradiation of C and Sn doped Si leads to prominent absorption lines at 873.5 and 1025 cm-1. These are assigned to a carbon interstitial trapped by a substitutional Sn atom. The calculated modes are in good agreement with those observed. The calculations also suggest that a close-by pair of substitutional C and Sn will be a stable but electrically inert defect. This defect may account for the experimentally observed drop in the concentration of the Cs-Ci defect after a room temperature annealing. Finally, we suggest Sn-C codoping of Si for manufacturing of radiation hard silicon.


Publication metadata

Author(s): Briddon PR; Jones R; Lavrov EV; Fanciulli M; Kaukonen M

Publication type: Article

Publication status: Published

Journal: Physical Review B - Condensed Matter and Materials Physics

Year: 2001

Volume: 64

Issue: 12

Pages: 125212 - 125212-5

ISSN (print): 0163-1829

ISSN (electronic): 1095-3795

Publisher: American Physical Society

URL: http://dx.doi.org/10.1103/PhysRevB.64.125212

DOI: 10.1103/PhysRevB.64.125212


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